OssDsign

OssDsign

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OssDsign - Strengthening its base

20 september 2020

Solidifying US patent portfolio; well-protected until 2035
Clinical data in the oral cavity supports platform potential
Over 1,000 patients treated further validating the case
Strengthened patent coverage for OssDsign Cranial in the US
OssDsign announced that it has received patent approval for the implant design for its lead product OssDsign Cranial PSI in the US. The patent was previously allowed in Europe, Japan and Australia and covers the implant, its support structure as well as the additive manufacturing method. The patent family is valid until 2035 and adds to an extensive patent protection in Europe and the US, related both to implant design as well as the company’s material technology. While standalone materials such as titanium can integrate with bone tissue, no other implant for craniofacial applications combines bone regeneration with the stability of titanium, making OssDsign’s implants unique.

Clinical data supports use outside craniofacial applications
The company also recently announced positive interim results from a clinical study (n=20) using OssDsign’s proprietary calcium phosphate material in the oral cavity. Six month follow-up showed that implantation of the granular calcium phosphate material in the maxillary sinus floor resulted in bone formation and firm anchoring of dental implants. While we believe a commercial product for dental indications lies many years out in the future, the results validates the platform potential that the material can be applied in more ways, shapes and forms than what is currently available – addressing new clinical indications.

Underlying momentum supports commercial activities
OssDsign continues its underlying growth momentum, now having its patented material successfully used in >1,000 patients (vs. 500 in 2018). With the new CEO Morten Henneveld in place since 1 September and an upcoming launch in Japan during H2’20e, OssDsign are well-positioned to drive the growth of the company to the next level.

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